Beam splitter

ABSTRACT

A beam splitter formed by laminating a plurality of optical films on a glass substrate having a refractive index of 1.51±0.10. The optical films are first, second, third, fourth, and fifth layers laminated in this order from the glass substrate. The first layer has a refractive index of 1.44±0.10 and an optical film thickness of 0.05-0.15; the second layer has a refractive index of 1.68±0.10 and an optical film thickness of 0.01-0.10; the third layer has a refractive index of 1.44±0.10 and an optical film thickness of 0.50-0.60; the fourth layer has a refractive index of 2.23±0.10 and an optical film thickness of 0.25-0.35; and the fifth layer has a refractive index of 1.44±0.10 and an optical film thickness of 0.25-0.35. The optical film thickness means a relative value represented by n×d/λ where n denotes a refractive index; d denotes an actual film thickness, and λ denotes a wavelength deciding the center of a wavelength band. The beam splitter can reduce the polarization dependency of a branching ratio with a beam incident angle of 22.5°.

This application is a division of application Ser. No. 08/556,771, filedNov. 2, 1995, now U.S. Pat. 5,661,602.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a beam splitter for use in a lightamplification module or the like.

2. Description of the Related Art

In a light amplification module, for example, a part of signal light istaken out as monitor light by a beam splitter, and the power of themonitor light is detected. Then, the signal light is amplified accordingto fluctuations in the power of the monitor light. In such a beamsplitter used, for example, to branch the monitor light from the signallight, it is desired to reduce polarization dependency such that abranching ratio in the beam splitter differs between P-polarized lightand S-polarized light.

The beam splitter is used to branch a single light beam into two or morelight beams. Conversely, the beam splitter is used also to couple two ormore light beams into a single light beam. The beam splitter isconfigured by laminating a plurality of optical films formed ofdielectric or the like on a glass substrate, and light is incident onthe multilayered optical films and introduced to an optical axis with apredetermined beam incident angle set, thus functioning to reflect apart of the incident light on the multilayered optical films andtransmit the remaining part. The term beam incident angle means an angledefined between a line perpendicular to the multilayered optical filmsof the beam splitter and a beam of incident light. In a conventionalbeam splitter, the beam incident angle is set to 10° or less or 45°, andthe polarization dependency of the branching ratio such that thebranching ratio is different between P-polarized light and S-polarizedlight on the reflection side (i.e., the difference between reflectedP-polarized light and reflected S-polarized light) is about 0.5 dB. TheP-polarized light means polarized light having a plane of polarizationparallel to a plane of incidence on the multilayered optical films, andthe S-polarized light means polarized light having a plane ofpolarization perpendicular to the plane of incidence.

In many cases, the beam incident angle in a short wave pass filter(SWPF) or a long wave pass filter (LWPF) used in a light amplificationmodule or the like is set to 22.5°. Accordingly, if the beam incidentangle in the beam splitter used in the light amplification module or thelike is set to 22.5°, the module can be designed with such an advantagethat the optical placement of optical elements can be made simple.Further, the polarization dependency on the reflection side in theconventional beam splitter is about 0.5 dB which is a relatively largevalue. Accordingly, in the case where an LD (laser diode) for generatinglinearly polarized light is used as a light source, the branching ratioin the beam splitter changes according to a polarized condition ofincident light, causing variations in characteristic of the beamsplitter, which are disadvantageous in practical use.

SUMMARY OF THE INVENTION

It is therefore an object of the present invention to provide a beamsplitter with the beam incident angle set to 22.5° and the polarizationdependency of the branching ratio reduced.

In accordance with an aspect of the present invention, there is provideda beam splitter formed by laminating a plurality of optical films on asubstrate, wherein:

said substrate comprises a glass substrate having a refractive index of1.51±0.10; and

said optical films comprise:

a first layer formed on said glass substrate, said first layer having arefractive index of 2.23±0.10 and an optical film thickness of0.40-0.50;

a second layer formed on said first layer, said second layer having arefractive index of 1.44±0.10 and an optical film thickness of0.40-0.50;

a third layer formed on said second layer, said third layer having arefractive index of 2.23±0.10 and an optical film thickness of0.30-0.40;

a fourth layer formed on said third layer, said fourth layer having arefractive index of 1.44±0.10 and an optical film thickness of0.10-0.20;

a fifth layer formed on said fourth layer, said fifth layer having arefractive index of 2.23±0.10 and an optical film thickness of0.10-0.20;

a sixth layer formed on said fifth layer, said sixth layer having arefractive index of 1.44±0.10 and an optical film thickness of0.10-0.20;

a seventh layer formed on said sixth layer, said seventh layer having arefractive index of 2.23±0.10 and an optical film thickness of0.10-0.20;

an eighth layer formed on said seventh layer, said eighth layer having arefractive index of 1.44±0.10 and an optical film thickness of0.20-0.30;

a ninth layer formed on said eighth layer, said ninth layer having arefractive index of 2.23±0.10 and an optical film thickness of0.55-0.65;

a tenth layer formed on said ninth layer, said tenth layer having arefractive index of 1.44±0.10 and an optical film thickness of0.40-0.50;

an eleventh layer formed on said tenth layer, said eleventh layer havinga refractive index of 2.23±0.10 and an optical film thickness of2.50-3.50; and

a twelfth layer formed on said eleventh layer, said twelfth layer havinga refractive index of 1.44±0.10 and an optical film thickness of0.20-0.30.

The optical film thickness means a relative value represented by n×d/λwhere n denotes a refractive index; d denotes an actual film thickness;and λ denotes a wavelength which determines a center of wavelength bandused.

The present inventors have proved that a beam splitter with the beamincident angle set to 22.5° and the polarization dependency of abranching ratio reduced to 0.1-0.2 dB or less on the reflection side canbe realized by setting the refractive index of the glass substrate, thenumber of layers of the optical films, and the refractive index and theoptical film thickness of each optical film as defined above.Accordingly, it is possible to realize a beam splitter with the beamincident angle set to 22.5° which is the same as that set in otheroptical components such as a short wave pass filter (SWPF) and a longwave pass filter (LWPF) used in a light amplification module or thelike, thereby making easy the designing of the light amplificationmodule or the like, e.g., making simple the optical placement of opticalelements. Further, since the polarization dependency of the branchingratio is small, there is no possibility that the branching ratio in thebeam splitter may change according to a polarized condition of incidentlight, thereby realizing a fixed characteristic.

The above and other objects, features and advantages of the presentinvention and the manner of realizing them will become more apparent,and the invention itself will best be understood from a study of thefollowing description and appended claims with reference to the attacheddrawings showing some preferred embodiments of the invention.

DESCRIPTION OF THE DRAWINGS

FIG. 1 is a view showing the basic configuration of a beam splitteraccording to the present invention;

FIG. 2 graph showing the characteristic of a beam splitter according toa first preferred embodiment of the present invention;

FIG. 3 is a graph showing the characteristic of a beam splitteraccording to a second preferred embodiment of the present invention;

FIG. 4 is a graph showing the characteristic of a beam splitteraccording to a third preferred embodiment of the present invention;

FIG. 5 is a graph showing the characteristic of a beam splitteraccording to a fourth preferred embodiment of the present invention;

FIG. 6 is a graph showing the characteristic of a beam splitteraccording to a fifth preferred embodiment of the present invention; and

FIG. 7 is a graph showing the characteristic of a beam splitteraccording to a sixth preferred embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Some preferred embodiments of the present invention will now bedescribed with reference to the drawings. FIG. 1 is a view showing thebasic configuration of a beam splitter according to the presentinvention. The beam splitter is configured by laminating a plurality ofoptical films 2 on a glass substrate 1. The material of each opticalfilm 2 is so selected as to form a high-refractive index layer, amedium-refractive index layer, or a low-refractive index layer. Eachoptical film 2 is formed by sputtering, electron beam evaporation, etc.so as to have a predetermined thickness. In the following description,the term of optical film thickness means a relative index represented byn×d/λ where n denotes a refractive index; d denotes an actual filmthickness; and λ denotes a wavelength which determines a center ofwavelength band used.

First Preferred Embodiment

In this preferred embodiment, the optical films 2 are totally twelvelayers of the first layer to the twelfth layer, and they are configuredby alternately laminating the high-refractive index layers and thelow-refractive index layers on the glass substrate 1 as mentioned below.The refractive index of the glass substrate 1 and the refractive indexand the optical film thickness of each optical film 2 are set asfollows:

    ______________________________________                                                 Refractive Index                                                                        Optical Film Thickness                                     ______________________________________                                        Substrate: 1.51 ± 0.10                                                                            --                                                     First Layer:                                                                             2.23 ± 0.10                                                                            0.40-0.50                                              Second Layer:                                                                            1.44 ± 0.10                                                                            0.40-0.50                                              Third Layer:                                                                             2.23 ± 0.10                                                                            0.30-0.40                                              Fourth Layer:                                                                            1.44 ± 0.10                                                                            0.10-0.20                                              Fifth Layer:                                                                             2.23 ± 0.10                                                                            0.10-0.20                                              Sixth Layer:                                                                             1.44 ± 0.10                                                                            0.10-0.20                                              Seventh Layer:                                                                           2.23 ± 0.10                                                                            0.10-0.20                                              Eighth Layer                                                                             1.44 ± 0.10                                                                            0.20-0.30                                              Ninth Layer:                                                                             2.23 ± 0.10                                                                            0.55-0.65                                              Tenth Layer:                                                                             1.44 ± 0.10                                                                            0.40-0.50                                              Eleventh Layer:                                                                          2.23 ± 0.10                                                                            2.50-3.50                                              Twelfth Layer:                                                                           1.44 ± 0.10                                                                            0.20-0.30                                              External Medium:                                                                         1.00        --                                                     ______________________________________                                    

The glass substrate 1 is formed of BK-7 glass. The high-refractive indexlayers, i.e., the first layer, the third layer, the fifth layer, theseventh layer, the ninth layer, and the eleventh layer, are formed ofTiO₂ (titanium dioxide). The low-refractive index layers, i.e., thesecond layer, the fourth layer, the sixth layer, the eighth layer, thetenth layer, and the twelfth layer, are formed of SiO₂ (silicondioxide). The high-refractive index layers may be formed of Ta₂ O₅(ditantalum pentaoxide). FIG. 2 shows the characteristic of the beamsplitter configured above when light is incident on the beam splitter ata beam incident angle of 22.5°. In FIG. 2, the vertical axis representsa transmittance (%), and the horizontal axis represents a wavelength(nm), in which the center wavelength is 1550 nm. Further, in FIG. 2, thecharacteristic of P-polarized light is shown by a symbol P, and thecharacteristic of S-polarized light is shown by a symbol S. As apparentfrom FIG. 2, the beam splitter configured above can greatly reduce thepolarization dependency of the branching ratio in the wavelength band of10 nm or more about 1550 nm. The branching ratio (reflected light:transmitted light) of the beam splitter in this preferred embodiment is1:7. In this manner, the beam splitter with the beam incident angle setto 22.5° and the polarization dependency of the branching ratio reducedcan be realized. Accordingly, the optical placement of optical elementsin a light amplification module or the like employing this beam splittercan be made simple, thereby allowing easy designing. Furthermore, thecharacteristic fixed irrespective of a polarized condition of incidentlight can be realized.

Second Preferred Embodiment

In this preferred embodiment, the optical films 2 are totally fivelayers of the first layer to the fifth layer, and they are configured bylaminating the high-refractive index layer, the medium-refractive indexlayer, and the low-refractive index layers on the glass substrate 1 asmentioned below. The refractive index of the glass substrate 1 and therefractive index and the optical film thickness of each optical film 2are set as follows:

    ______________________________________                                                 Refractive Index                                                                        Optical Film Thickness                                     ______________________________________                                        Substrate: 1.51 ± 0.10                                                                            --                                                     First Layer:                                                                             1.44 ± 0.10                                                                            0.05-0.15                                              Second Layer:                                                                            1.68 ± 0.10                                                                            0.01-0.10                                              Third Layer:                                                                             1.44 ± 0.10                                                                            0.50-0.60                                              Fourth Layer:                                                                            2.23 ± 0.10                                                                            0.25-0.35                                              Fifth Layer:                                                                             1.44 ± 0.10                                                                            0.25-0.35                                              External Medium:                                                                         1.00        --                                                     ______________________________________                                    

The glass substrate 1 is formed of BK-7 glass. The high-refractive indexlayer, i.e., the fourth layer, is formed of TiO₂ (titanium dioxide). Themedium-refractive index layer, i.e., the second layer, is formed of Al₂0₃ (alumina). The low-refractive index layers, i.e., the first layer,the third layer, and the fifth layer, are formed of SiO₂ (silicondioxide). The high-refractive index layer may be formed of Ta₂ O₅(ditantalum pentaoxide). FIG. 3 shows the characteristic of the beamsplitter configured above when light is incident on the beam splitter ata beam incident angle of 22.5°. In FIG. 3, the vertical axis representsa transmittance (%), and the horizontal axis represents a wavelength(nm), in which the center wavelength is 1550 nm. Further, in FIG. 3, thecharacteristic of P-polarized light is shown by a symbol P, and thecharacteristic of S-polarized light is shown by a symbol S. As apparentfrom FIG. 3, the beam splitter configured above can greatly reduce thepolarization dependency of the branching ratio in the wavelength band of10 nm or more about 1550 nm. The branching ratio (reflected light:transmitted light) of the beam splitter in this preferred embodiment is1:16. In this manner, the beam splitter with the beam incident angle setto 22.5° and the polarization dependency of the branching ratio reducedcan be realized. Accordingly, the optical placement of optical elementsin a light amplification module or the like employing this beam splittercan be made simple, thereby allowing easy designing. Furthermore, thecharacteristic fixed irrespective of a polarized condition of incidentlight can be realized.

Third Preferred Embodiment

In this preferred embodiment, the optical films 2 are totally threelayers of the first layer to the third layer, and they are configured byalternately laminating the high-refractive index layer and thelow-refractive index layers on the glass substrate 1 as mentioned below.The refractive index of the glass substrate 1 and the refractive indexand the optical film thickness of each optical film 2 are set asfollows:

    ______________________________________                                                 Refractive Index                                                                        Optical Film Thickness                                     ______________________________________                                        Substrate: 1.51 ± 0.10                                                                            --                                                     First Layer:                                                                             1.46 ± 0.10                                                                            0.73-0.83                                              Second Layer:                                                                            2.30 ± 0.10                                                                            0.13-0.23                                              Third Layer:                                                                             1.46 ± 0.10                                                                            0.22-0.32                                              External Medium:                                                                         1.00        --                                                     ______________________________________                                    

The glass substrate 1 is formed of BK-7 glass. The high-refractive indexlayer, i.e., the second layer, is formed of TiO₂ (titanium dioxide). Thelow-refractive index layers, i.e., the first layer and the third layer,are formed of SiO₂ (silicon dioxide). The high-refractive index layermay be formed of Ta₂ O₅ (ditantalum pentaoxide). FIG. 4 shows thecharacteristic of the beam splitter configured above when light isincident on the beam splitter at a beam incident angle of 22.5°. In FIG.4, the vertical axis represents a transmittance (%), and the horizontalaxis represents a wavelength (nm), in which the center wavelength is1550 nm. Further, in FIG. 4, the characteristic of P-polarized light isshown by a symbol P, and the characteristic of S-polarized light isshown by a symbol S. As apparent from FIG. 4, the beam splitterconfigured above can reduce the polarization dependency of the branchingratio in the wavelength band of ±10 nm or more about 1550 nm. Thebranching ratio (reflected light: transmitted light) of the beamsplitter in this preferred embodiment is 1:16. In this manner, the beamsplitter with the beam incident angle set to 22.5° and the polarizationdependency of the branching ratio reduced can be realized. Accordingly,the optical placement of optical elements in a light amplificationmodule or the like employing this beam splitter can be made simple,thereby allowing easy designing. Furthermore, the characteristic fixedirrespective of a polarized condition of incident light can be realized.

Fourth Preferred Embodiment

In this preferred embodiment, the optical films 2 are totally threelayers of the first layer to the third layer, and they are configured byalternately laminating the high-refractive index layer and thelow-refractive index layers on the glass substrate 1 as mentioned below.The refractive index of the glass substrate 1 and the refractive indexand the optical film thickness of each optical film 2 are set asfollows:

    ______________________________________                                                 Refractive Index                                                                        Optical Film Thickness                                     ______________________________________                                        Substrate: 1.51 ± 0.10                                                                            --                                                     First Layer:                                                                             1.44 ± 0.10                                                                            0.58-0.68                                              Second Layer:                                                                            2.23 ± 0.10                                                                            0.25-0.35                                              Third Layer:                                                                             1.44 ± 0.10                                                                            0.18-0.28                                              External Medium:                                                                         1.00        --                                                     ______________________________________                                    

The glass substrate 1 is formed of BK-7 glass. The high-refractive indexlayer, i.e., the second layer, is formed of TiO₂ (titanium dioxide). Thelow-refractive index layers, i.e., the first layer and the third layer,are formed of SiO₂ (silicon dioxide). The high-refractive index layermay be formed of Ta₂ O₅ (ditantalum pentaoxide). FIG. 5 shows thecharacteristic of the beam splitter configured above when light isincident on the beam splitter at a beam incident angle of 22.5°. In FIG.5, the vertical axis represents a transmittance (%), and the horizontalaxis represents a wavelength (nm), in which the center wavelength is1550 nm. Further, in FIG. 5, the characteristic of P-polarized light isshown by a symbol P, and the characteristic of S-polarized light isshown by a symbol S. As apparent from FIG. 5, the beam splitterconfigured above can reduce the polarization dependency of the branchingratio in the wavelength band of ±10 nm or more about 1550 nm. Thebranching ratio (reflected light : transmitted light) of the beamsplitter in this preferred embodiment is 1:17. In this manner, the beamsplitter with the beam incident angle set to 22.5° and the polarizationdependency of the branching ratio reduced can be realized. Accordingly,the optical placement of optical elements in a light amplificationmodule or the like employing this beam splitter can be made simple,thereby allowing easy designing. Furthermore, the characteristic fixedirrespective of a polarized condition of incident light can be realized.

Fifth Preferred Embodiment

In this preferred embodiment, the optical films 2 are totally six layersof the first layer to the sixth layer, and they are configured byalternately laminating the high-refractive index layers and thelow-refractive index layers on the glass substrate 1 as mentioned below.The refractive index of the glass substrate 1 and the refractive indexand the optical film thickness of each optical film 2 are set asfollows:

    ______________________________________                                                 Refractive Index                                                                        Optical Film Thickness                                     ______________________________________                                        Substrate: 1.51 ± 0.10                                                                            --                                                     First Layer:                                                                             1.44 ± 0.10                                                                            0.54-0.64                                              Second Layer:                                                                            2.23 ± 0.10                                                                            0.49-0.59                                              Third Layer:                                                                             1.44 ± 0.10                                                                            0.90-1.30                                              Fourth Layer:                                                                            2.23 ± 0.10                                                                            0.21-0.31                                              Fifth Layer:                                                                             1.44 ± 0.10                                                                            0.23-0.33                                              Sixth Layer:                                                                             2.23 ± 0.10                                                                            0.48-0.58                                              External Medium:                                                                         1.00        --                                                     ______________________________________                                    

The glass substrate 1 is formed of BK-7 glass. The high-refractive indexlayers, i.e., the second layer, the fourth layer, and the sixth layer,are formed of TiO₂ (titanium dioxide). The low-refractive index layers,i.e., the first layer, the third layer, and the fifth layer, are formedof SiO₂ (silicon dioxide). The high-refractive index layers may beformed of Ta₂ O₅ (ditantalum pentaoxide). FIG. 6 shows thecharacteristic of the beam splitter configured above when light isincident on the beam splitter at a beam incident angle of 22.5°. In FIG.6, the vertical axis represents a transmittance (%), and the horizontalaxis represents a wavelength (nm), in which the center wavelength is1550 nm. Further, in FIG. 6, the characteristic of P-polarized light isshown by a symbol P, and the characteristic of S-polarized light isshown by a symbol S. As apparent from FIG. 6, the beam splitterconfigured above can reduce the polarization dependency of the branchingratio in the wavelength band of 10 nm or more about 1550 nm. Thebranching ratio (reflected light : transmitted light) of the beamsplitter in this preferred embodiment is 1:18. In this manner, the beamsplitter with the beam incident angle set to 22.5° and the polarizationdependency of the branching ratio reduced can be realized. Accordingly,the optical placement of optical elements in a light amplificationmodule or the like employing this beam splitter can be made simple,thereby allowing easy designing. Furthermore, the characteristic fixedirrespective of a polarized condition of incident light can be realized.

Sixth Preferred Embodiment

In this preferred embodiment, the optical films 2 are totally twelvelayers of the first layer to the twelfth layer, and they are configuredby alternately laminating the high-refractive index layers and thelow-refractive index layers on the glass substrate 1 as mentioned below.The refractive index of the glass substrate 1 and the refractive indexand the optical film thickness of each optical film 2 are set asfollows:

    ______________________________________                                                 Refractive Index                                                                        Optical Film Thickness                                     ______________________________________                                        Substrate: 1.51 ± 0.10                                                                            --                                                     First Layer:                                                                             2.23 ± 0.10                                                                            0.39-0.50                                              Second Layer:                                                                            1.44 ± 0.10                                                                            0.40-0.50                                              Third Layer:                                                                             2.23 ± 0.10                                                                            0.27-0.40                                              Fourth Layer:                                                                            1.44 ± 0.10                                                                            0.07-0.20                                              Fifth Layer:                                                                             2.23 ± 0.10                                                                            0.09-0.20                                              Sixth Layer:                                                                             1.44 ± 0.10                                                                            0.10-0.20                                              Seventh Layer:                                                                           2.23 ± 0.10                                                                            0.13-0.23                                              Eighth Layer:                                                                            1.44 ± 0.10                                                                            0.20-0.33                                              Ninth Layer:                                                                             2.23 ± 0.10                                                                            0.50-0.65                                              Tenth Layer:                                                                             1.44 ± 0.10                                                                            0.30-0.50                                              Eleventh Layer:                                                                          2.23 ± 0.10                                                                            2.40-3.50                                              Twelfth Layer:                                                                           1.44 ± 0.10                                                                            0.19-0.30                                              External Medium:                                                                         1.00        --                                                     ______________________________________                                    

The glass substrate 1 is formed of BK-7 glass. The high-refractive indexlayers, i.e., the first layer, the third layer, the fifth layer, theseventh layer, the ninth layer, and the eleventh layer, are formed ofTiO₂ (titanium dioxide). The low-refractive index layers, i.e., thesecond layer, the fourth layer, the sixth layer, the eighth layer, thetenth layer, and the twelfth layer, are formed of SiO₂ (silicondioxide). The high-refractive index layers may be formed of Ta₂ O₅(ditantalum pentaoxide). FIG. 7 shows the characteristic of the beamsplitter configured above when light is incident on the beam splitter ata beam incident angle of 22.5°. In FIG. 7, the vertical axis representsa transmittance (%), and the horizontal axis represents a wavelength(nm), in which the center wavelength is 1550 nm. Further, in FIG. 7, thecharacteristic of P-polarized light is shown by a symbol P, and thecharacteristic of S-polarized light is shown by a symbol S. As apparentfrom FIG. 7, the beam splitter configured above can greatly reduce thepolarization dependency of the branching ratio in the wavelength band of10 nm or more about 1550 nm. The branching ratio (reflected light:transmitted light) of the beam splitter in this preferred embodiment is1:9. In this manner, the beam splitter with the beam incident angle setto 22.5° and the polarization dependency of the branching ratio reducedcan be realized. Accordingly, the optical placement of optical elementsin a light amplification module or the like employing this beam splittercan be made simple, thereby allowing easy designing. Furthermore, thecharacteristic fixed irrespective of a polarized condition of incidentlight can be realized.

What is claimed is:
 1. A beam splitter formed by laminating a pluralityof optical films on a substrate, said beam splitter branching anincident beam having a wavelength band into a reflected beam and atransmitting beam, said reflected beam and said transmitting beam havingthe same wavelength as said incident beam, whereinsaid substratecomprises a glass substrate having a refractive index of 1.51±0.10; andsaid optical films comprise:a first layer formed on said glasssubstrate, said first layer having a refractive index of 1.46±0.10 andan optical film thickness of 0.73-0.83; a second layer formed on saidfirst layer, said second layer having a refractive index of 2.30±0.10and an optical film thickness of 0.13-0.23; and a third layer formed onsaid second layer, said third layer having a refractive index of1.46±0.10 and an optical film thickness of 0.22-0.32, said wavelengthband being given by wavelengths above 300 nm.
 2. A beam splitteraccording to claim 1, wherein:said first layer and said third layer aredeposited films formed of SiO₂ ; and said second layer is a depositedfilm formed of TiO₂ or Ta₂ O₅.
 3. A beam splitter formed by laminating aplurality of optical films on a substrate, wherein:said substratecomprises a glass substrate having a refractive index of 1.51±0.10; andsaid optical films consist of:a first layer formed on said glasssubstrate, said first layer having a refractive index of 1.46±0.10 andan optical film thickness of 0.73-0.83; a second layer formed on saidfirst layer, said second layer having a refractive index of 2.30±0.10and an optical film thickness of 0.13-0.23; and a third layer formed onsaid second layer, said third layer having a refractive index of1.46±0.10 and an optical film thickness of 0.22-0.32.
 4. A beam splitteraccording to claim 3, wherein:said first layer and said third layer aredeposited films formed of SiO₂ ; and said second layer is a depositedfilm formed of TiO₂ or Ta₂ O₅.
 5. A beam splitter for branching anincident beam having a wavelength band into a reflected beam and atransmitting beam, said beam splitter comprising:a first layer having arefractive index of 1.46±0.10 and an optical film thickness of0.73-0.83; a second layer formed on said first layer, said second layerhaving a refractive index of 2.30±0.10 and an optical film thickness of0.13-0.23; and a third layer formed on said second layer, said thirdlayer having a refractive index of 1.46±0.10 and an optical filmthickness of 0.22-0.32, said wavelength band being given by wavelengthsabove 450 nm, each of said optical film thicknesses being represented bynd/λ where n denotes a refractive index; d denotes an actual filmthickness; and λ denotes a wavelength which determines a center of saidwavelength band.
 6. The beam splitter as recited in claim 5, furthercomprising a glass substrate having a refractive index of 1.51±0.10,said first layer being formed on said glass substrate.
 7. The beamsplitter as recited in claim 5, wherein;said first layer and said thirdlayer are deposited films formed of SiO₂ ; and said second layer is adeposited film formed of TiO₂ or Ta₂ O₅.
 8. The beam splitter as recitedin claim 5, wherein said wavelength band is given by wavelengths around1,550 nm.